A cutting-edge simulation technique that combines artificial intelligence with traditional first-principles calculations has revolutionized the understanding of semiconductor circuit polishing mechanisms. This new Neural Network Potential (NNP) technology offers remarkable speed enhancements while maintaining the accuracy of first-principles calculations. By implementing NNP in the simulation of CMP slurry for semiconductor circuit polishing, Resonac has paved the way for rapid material discovery in the complex semiconductor manufacturing process.… Read the rest
Innovative Simulation Techniques Revolutionize Semiconductor Polishing Process
