Chemical Reaction Simulation

Chemical Reaction Simulation
Innovative Simulation Techniques Revolutionize Semiconductor Polishing Process

Innovative Simulation Techniques Revolutionize Semiconductor Polishing Process

A cutting-edge simulation technique that combines artificial intelligence with traditional first-principles calculations has revolutionized the understanding of semiconductor circuit polishing mechanisms. This new Neural Network Potential (NNP) technology offers remarkable speed enhancements while maintaining the accuracy of first-principles calculations. By implementing NNP
August 6, 2024
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